Etching Technology for Microchannels
نویسندگان
چکیده
can be varied from perfectly isotropic to exactly straight. Also positive or negative tapering is po~s ib le .~ Various ways of fabricating channels in silicon are The basic approach for disyussed. Some new channels are presented: the constructing channels in GPSIC's and the LPCVD covered channels. Also some silicon is almost always attention is paid to the problem of making connections as depicted in figure 1: the silicon (in this case (100) oriented) is
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